NanoFrazor Explore

Major Functions / Key Features

Nanofrazor is a high-resolution, direct-write lithography technique that enables the fabrication of complex nanostructures with exceptional precision. It uses a scanning probe microscope with a laser-powered tip to pattern materials at the nanoscale, achieving feature sizes as small as a few nanometers. Nanofrazor's versatility allows for the creation of 3D structures using a wide range of materials, making it a valuable tool for applications in fields like nanoelectronics, nanophotonics, and advanced materials science.

• Some key features and capabilities of Nanofrazor include:
  Nanometer-scale Resolution: Nanofrazor can achieve feature sizes as small as a few nanometers, enabling the creation of intricate nanostructures with exceptional detail.
• Direct-write Capabilities: The technique allows for the direct writing of patterns and structures, eliminating the need for complex multi-step manufacturing processes.
• Material Versatility: Nanofrazor can be used with a variety of materials, including metals, semiconductors, and organic compounds, expanding the range of potential applications.
• Three-dimensional Fabrication: The technology enables the fabrication of complex three-dimensional structures, opening up new possibilities in areas such as photonics, electronics, and biomedicine.
• High Throughput: Advancements in the technology have led to improved throughput, making Nanofrazor a viable solution for industrial-scale manufacturing.