Physical Vapour Deposition (PVD) System
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Specifications
Major Functions / Key Features
- Coating process: Arc and Sputter mode
- Applicable substrate: Polymer, glass, metals and ceramic
- Process temperature up to 400oC
- Sample size: 200 mm x 300 mm
- Target available: C, Cu, Al, Zr, Cr, Ti, TiAl, TiAlCr, stainless steel 316 or user's target
- Application sample:
- Conductive coating: Cu, Al
- Hard coating: ZrO, Al203, CrN, CrCN, TiN, TiCN, TiAlCrN
- In-situ process plasma treatment process for cleaning, surface activation and etching
Location
W401bRestriction
Apply to contact person using Form ICT01 / ICT02
Fee
Material cost will be chargedOther Information
Manufacturer: MAT Dresden
Model: MAT400
Category: Engineering | Materials Science | Materials technology
Owned by: Industrial Centre
Contacts
Ir Wong Wing Fai
Industrial Centre
- 2766 7616
- sidney.wong@polyu.edu.hk
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