Physical Vapour Deposition (PVD) System

Specifications

Major Functions / Key Features Location Restriction Fee Other Information

Major Functions / Key Features

Coating process: Arc and Sputter mode
Applicable substrate: Polymer, glass, metals and ceramic
Process temperature up to 400^oC
Sample size: 200 mm x 300 mm
Target available: C, Cu, Al, Zr, Cr, Ti, TiAl, TiAlCr, stainless steel 316 or user's target
Application sample:
- Conductive coating: Cu, Al
- Hard coating: ZrO, Al203, CrN, CrCN, TiN, TiCN, TiAlCrN
In-situ process plasma treatment process for cleaning, surface activation and etching

Location

W401b

Restriction

Booking is required. Online booking can be made via IC webpage at https://www.polyu.edu.hk/ic/research-and-project-support/list-of-facilities/

Fee

Material cost will be charged

Other Information

Manufacturer: MAT Dresden

Model: MAT400

Category: Engineering | Materials Science | Materials technology

Owned by: Industrial Centre

Contacts

Ir Wong Wing Fai

Industrial Centre

2766 7616
sidney.wong@polyu.edu.hk

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