Anti-reflection Haze Film for Optoelectronic Devices

Traditional manufacturing of anti-reflection coating require complicated lithography process. Moreover, major light absorption loss is caused from the insufficient thickness of the absorbers.

The development of self-formed haze film improves the performance of optoelectronic devices by elongating the optical path, and anti-reflection effect. The substrate of the haze film is commercially available polydimethylsiloxane (PDMS), which is cheap, flexible and highly transparent. The haze film is obtained by curing the mixture of PDMS pre-polymer, curing agent and a polymeric additive.

This technology is good for photodetectors or displays, the anti-reflection effect improves the sensitivity of the detector, or enhances the brightness of the screen. For photovoltaics, the haze film enhances the power conversion efficiency significantly.