EZ Imprinting PL400 Nano-imprinter

Introduction:

Nano-imprint system is used to fabricate nanometer scale patterns. It utilizes a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by UV light during the imprinting process. Adhesion between the resist and the template is controlled to allow proper release.

Specifications:

• Substrate size: Up to 4”
• Resolution: Up to sub-10nm
• Auto-Release process: Prevent mold/ substrate damage
• Application: Optical devices, displays, data storage, biomedical devices, semiconductor IC etc.

Notes to user:

Supplier information:

         http://ezimprinting.com/index.html

Equipment location:

Room HJ705 (Class 100)