Sawatec Spin Coater (Photoresist Only)

Introduction:

The spin coater is used to deposit uniform thin films to flat substrates. Usually a small amount of coating material is applied on the center of the substrate, which is either spinning at low speed or not spinning at all. The substrate is then rotated at high speed in order to spread the coating material by centrifugal force.

Specification:

• Substrate size: Up to 4”
• Recipes: Up to 50 recipes
• Max. speed: 10,000 rpm

Notes to user:

Only for spinning photoresist

Supplier information:

         https://sawatec.com/en/

Equipment location:

Room HJ705 (Class 100)