Skip to main content Start main content

Introduction:

THERMALThermal evaporation is a simplest form of of physical vapor deposition. A resistive heat source is used to heat and evaporate source materials to achieve appreciable vapor pressure in a vacuum environment and form a thin film on the substrate.

 

Specifications / Applications:

  • Electrical contacts, metallic contract layers, etc.
  • Source materials available: Aluminum, Chromium, Gold
  • Single source
  • Resistive heating power: 15 A / 2 kW
  • Substrate size: 2” diameter
  • Rate sensor not available

 

Notes to user:

User are required to clean all sources / targets / substrate holder and chamber upon each usage.

 

Equipment location:

Room BC708

 

Your browser is not the latest version. If you continue to browse our website, Some pages may not function properly.

You are recommended to upgrade to a newer version or switch to a different browser. A list of the web browsers that we support can be found here