OAI MBA800 Mask Aligner

Introduction:

UV mask aligner is equipment used in microfabrication to pattern parts of a thin film or the bulk of a substrate. It uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical "photoresist", or simply "resist," on the substrate. A series of chemical treatments then either engraves the exposure pattern into, or enables deposition of a new material in the desired pattern upon, the material underneath the photoresist.

Specifications:

• Light source: 450W UV light
• Resolution: <1µm max.
• Alignment: Frontside and backside 
• Mask chuck: 4”
• Substrate: Up to 4” round wafer
• Microscope: Dual CCTV video microscopes

Notes to user:

Supplier information:

         http://www.oainet.com/

Equipment location:

Room HJ705 (Class 100)