SUSS MA6 Mask Aligner

Introduction:

UV mask aligner is equipment used in microfabrication to pattern parts of a thin film or the bulk of a substrate. It uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical "photoresist", or simply "resist," on the substrate. A series of chemical treatments then either engraves the exposure pattern into, or enables deposition of a new material in the desired pattern upon, the material underneath the photoresist.

Specifications:

• Light source: 350W UV light
• Resolution: <0.8µm max.
• Alignment: Top side alignment
• Alignment accuracy: <± 0.5µm
• Substrate: Up to 4” round wafer

Notes to user:

Supplier information:

         https://www.suss.com/en  

Please click here to download the equipment introduction poster.

Equipment location:

Room HJ705 (Class 100)