Introduction:
UV mask aligner is equipment used in microfabrication to pattern parts of a thin film or the bulk of a substrate. It uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical "photoresist", or simply "resist," on the substrate. A series of chemical treatments then either engraves the exposure pattern into, or enables deposition of a new material in the desired pattern upon, the material underneath the photoresist.
Specifications:
- Light source: 450W UV light
- Resolution: <1µm max.
- Alignment: Frontside and backside
- Mask chuck: 4”
- Substrate: Up to 4” round wafer
- Microscope: Dual CCTV video microscopes
Notes to user:
Supplier information:
Equipment location:
Room HJ705 (Class 100)
