Research Equipment and Facilities
Start main content
  1. Home
  2. Large Equipment
  3. Physical Vapour Deposition (PVD) System

Physical Vapour Deposition (PVD) System

breadcrumb01

Specifications

Major Functions / Key Features Location Restriction Fee Other Information

Major Functions / Key Features

  • Coating process: Arc and Sputter mode
  • Applicable substrate: Polymer, glass, metals and ceramic
  • Process temperature up to 400oC
  • Sample size: 200 mm x 300 mm
  • Target available: C, Cu, Al, Zr, Cr, Ti, TiAl, TiAlCr, stainless steel 316 or user's target
  • Application sample: 
    • Conductive coating: Cu, Al
    • Hard coating: ZrO, Al203, CrN, CrCN, TiN, TiCN, TiAlCrN
  • In-situ process plasma treatment process for cleaning, surface activation and etching

Location

W401b

Restriction

Apply to contact person using Form ICT01 / ICT02

Fee

Material cost will be charged

Other Information

Manufacturer: MAT Dresden

Model: MAT400

Category: Engineering | Materials Science | Materials technology

Owned by: Industrial Centre

Contacts

Ir Wong Wing Fai

Industrial Centre

Related Equipment

ISE0004

2000W Fibre Laser System for Welding and Surface Engineering Work

Read More
ISE0001

Laser Rapid Forming (LRF) System

Read More
CEE0003

Compact Driving Simulator

Read More
CEE0002

Dynamic Shear Rheometer (DSR)

Read More
IC0001

Laser Photo Plotter

Read More
IC0007-03-01

NDT Equipment for Building Inspection

Read More

We use Cookies to give you a better experience on our website. By continuing to browse the site without changing your privacy settings, you are consenting to our use of Cookies. For more information, please see our Privacy Policy Statement.

Your browser is not the latest version. If you continue to browse our website, Some pages may not function properly.

You are recommended to upgrade to a newer version or switch to a different browser. A list of the web browsers that we support can be found here