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Tescan MIRA Field Emission Scanning Electron Microscope

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Specifications

Major Functions / Key Features

  • Imaging resolution down to 1.2 nm
  • Fully motorized compucentric five-axis sample stage accommodate specimen up to 4-inch in diameter
  • Apertureless optical design powered by In-flight Beam Tracing™
  • Unique Wide Field Optics™ design allows imaging magnifications as low as 2× without the need for an additional optical navigation camera
  • SingleVac™ mode as a standard feature for observing charging and beam-sensitive samples
  • Detectors:
    Everhart-Thormley Secondary Electron (SE)
    Retractable Backscattered Electron (BSE)
    In-beam Secondary Electron (In-beam SE)
    In-beam Backscatter Electron (In-beam BSE)
    • Beam Deceleration Technology (BDT) to enhance imaging performance at lower accelerating voltages
    • Energy Dispersive X-ray (EDX) Spectroscopy for element identification
    • Electron Backscatter Diffraction (EBSD) Analysis
    • Electron Beam Lithography (EBL)

Location

BC710

Restriction

Booking via URFMS online booking system

Fee

Internal PolyU Users: $250/ hr
UGC-funded Tertiary Institutes: $375/ hr
Other External Users: $1250/ hr

Other Information

Manufacturer: Tescan

Model: MIRA

Category: Materials science

Owned by: University Research Facility in Materials Characterization and Device Fabrication

Contacts

Dr Hardy Lui

University Research Facility in Materials Characterization and Device Fabrication


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