Tescan MIRA Field Emission Scanning Electron Microscope
Specifications
Major Functions / Key Features
- Imaging resolution down to 1.2 nm
- Fully motorized compucentric five-axis sample stage accommodate specimen up to 4-inch in diameter
- Apertureless optical design powered by In-flight Beam Tracing™
- Unique Wide Field Optics™ design allows imaging magnifications as low as 2× without the need for an additional optical navigation camera
- SingleVac™ mode as a standard feature for observing charging and beam-sensitive samples
- Detectors:
Everhart-Thormley Secondary Electron (SE)
Retractable Backscattered Electron (BSE)
In-beam Secondary Electron (In-beam SE)
In-beam Backscatter Electron (In-beam BSE)- Beam Deceleration Technology (BDT) to enhance imaging performance at lower accelerating voltages
- Energy Dispersive X-ray (EDX) Spectroscopy for element identification
- Electron Backscatter Diffraction (EBSD) Analysis
- Electron Beam Lithography (EBL)
Location
BC710Restriction
Booking via URFMS online booking systemFee
Internal PolyU Users: $250/ hrUGC-funded Tertiary Institutes: $375/ hr
Other External Users: $1250/ hr
Other Information
Manufacturer: Tescan
Model: MIRA
Category: Materials science
Owned by: University Research Facility in Materials Characterization and Device Fabrication
Contacts
Dr Hardy Lui
University Research Facility in Materials Characterization and Device Fabrication
- 27667791
- hardy.lui@polyu.edu.hk
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